New Plasma Profiling TOFMS™ from Horiba2013-04-15
This new instrumentation combines the speed of the GD plasma sputtering process with the rapidity and sensitivity of a Time of Flight Mass Spectrometer. Following a research phase conducted during a EU project (www.emdpa.eu), the instrument will be available from 2012 but prototypes are already available at HORIBA Jobin Yvon for demonstration.
The Plasma Profiling TOFMS offers higher sensitivity than GD OES and provides isotopic and molecular profiles.
Plasma Profiling TOFMS™ - Discover a Whole New World of Information
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